UV LED Lab Unit
GEW’s LED bench-top lab unit allows fast, accurate UV LED irradiation of samples or radiometers and can be specified with different wavelengths as required.
GEW’s LED lab unit utilises a high precision linear drive to pass a sample tray under the UV LED array.
Variable speed control ensures highly repeatable testing up to 100m/min with UV power adjustable in set increments and LED array height adjustable up to 25mm.
A simple magnetic hinged tray carries print samples or can accommodate an EIT radiometer for precise UV power measurement.
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GEW’s LED lab unit utilises a high precision linear drive to pass a sample tray under the UV LED array.
Variable speed control ensures highly repeatable testing up to 100m/min with UV power adjustable in set increments and LED array height adjustable up to 25mm.
A simple magnetic hinged tray carries print samples or can accommodate an EIT radiometer for precise UV power measurement.
Other Products and Services from GEW (EC) Ltd
NUVA2 HP
Fully air cooled, extreme high power lamp design perfect for web & industrial applications.
NUVA2 HP is the same NUVA2 cassette in a narrower format − the extra cooling available allows running up to 240W/cm, with maximum power decreasing as lamp length increases. Fully air-cooled, NUVA2 HP is available with a wide range of customisation options and is perfect for final cure inkjet applications (with iron-doped lamps) or high-speed web machines.
GEW’s patented reflectors are actively cooled to ensure that heat transfer to the substrate is minimised, whilst delivering the highest UV intensity and dose available. The quick-change cassette design ensures fast lamp changes with only 1 hex key tool required and all replaceable components are plug and play for easiest maintenance.
NUVA2 HP is the same NUVA2 cassette in a narrower format − the extra cooling available allows running up to 240W/cm, with maximum power decreasing as lamp length increases. Fully air-cooled, NUVA2 HP is available with a wide range of customisation options and is perfect for final cure inkjet applications (with iron-doped lamps) or high-speed web machines.
GEW’s patented reflectors are actively cooled to ensure that heat transfer to the substrate is minimised, whilst delivering the highest UV intensity and dose available. The quick-change cassette design ensures fast lamp changes with only 1 hex key tool required and all replaceable components are plug and play for easiest maintenance.
UV Lamp Curing Systems
Mercury lamp systems are an efficient, long-established UV light source for industrial processes and they are still growing in use today.
GEW’s UV lamp curing systems use medium pressure mercury vapour lamps as the UV light source. Depending on power level, length of lamp and form factor required, GEW have various lamp systems with different cooling methods to meet a vast array of UV irradiation applications.
GEW’s UV lamp curing systems use medium pressure mercury vapour lamps as the UV light source. Depending on power level, length of lamp and form factor required, GEW have various lamp systems with different cooling methods to meet a vast array of UV irradiation applications.
Substrate Cooling
Controlling temperature is critical for many applications. GEW’s array of cooling options ensures even the most powerful UV systems do not damage substrates.
The UV curing process is energy-intensive and causes both direct and indirect heating of the target substrate, which in the majority of cases needs to be controlled. For safety reasons, some form of barrier behind the target substrate to shield off and dissipate stray radiation from the lamp is essential for protecting the machine and its operators. The three most common methods of substrate cooling that meet both of these requirements are:
Air cooled heatsinks
Water cooled heatsinks
Water cooled chill rollers
Where roll material is being processed, the most common solution for this is an extruded aluminium heatsink plate. GEW have a very neat solution for this which is integral to the UV lamphead and can be either air or water cooled, depending on the application. For the majority of processes this method is very effective, unless very heat sensitive materials are being used.
The UV curing process is energy-intensive and causes both direct and indirect heating of the target substrate, which in the majority of cases needs to be controlled. For safety reasons, some form of barrier behind the target substrate to shield off and dissipate stray radiation from the lamp is essential for protecting the machine and its operators. The three most common methods of substrate cooling that meet both of these requirements are:
Air cooled heatsinks
Water cooled heatsinks
Water cooled chill rollers
Where roll material is being processed, the most common solution for this is an extruded aluminium heatsink plate. GEW have a very neat solution for this which is integral to the UV lamphead and can be either air or water cooled, depending on the application. For the majority of processes this method is very effective, unless very heat sensitive materials are being used.
GEW (EC) Ltd
Crompton Way, Crawley, West Sussex, RH10 9QR, United Kingdom
GEW (EC) Ltd designs and manufactures Arc and UV LED curing systems for printing, coating and converting applications. GEW is the leading manufacturer of UV curing systems for a range of markets, including narrow web label printing, offset printing, UV hot melt, wood coating and much more.