Excimer Systems
GEW excimer lamps produce vacuum ultraviolet radiation for a range of applications and can be seamlessly integrated onto machinery up to 2.55m wide.
GEW’s ExciRay lamp systems utilise dielectric barrier discharge (DBD) lamps to produce quasi-monochromatic vacuum ultraviolet radiation, typically at 172nm. This radiation is commonly used for mattification of surface coatings, modification of surface tension for improved adhesion or surface cleaning for semiconductor and medical industries.
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GEW’s ExciRay lamp systems utilise dielectric barrier discharge (DBD) lamps to produce quasi-monochromatic vacuum ultraviolet radiation, typically at 172nm. This radiation is commonly used for mattification of surface coatings, modification of surface tension for improved adhesion or surface cleaning for semiconductor and medical industries.
Other Products and Services from GEW (EC) Ltd
NUVA2
Fully air cooled up to 250cm, NUVA2 offers UV curing for wide substrate coating and specialist industrial applications.
NUVA2 is the most effective UV curing system for wide web coating and specialist industrial applications. Fully air cooled up to 250cm and available up to 27kW total lamp power, NUVA2 is available with a wide range of customisation and integration options.
GEW’s patented reflectors are actively cooled to ensure that heat transfer to the substrate is minimised, whilst delivering the highest UV intensity and dose available. The quick-change cassette design ensures fast lamp changes with only 1 hex key tool required and the innovative spherical lamp ends prevent breakages on long lamp changes.
NUVA2 is the most effective UV curing system for wide web coating and specialist industrial applications. Fully air cooled up to 250cm and available up to 27kW total lamp power, NUVA2 is available with a wide range of customisation and integration options.
GEW’s patented reflectors are actively cooled to ensure that heat transfer to the substrate is minimised, whilst delivering the highest UV intensity and dose available. The quick-change cassette design ensures fast lamp changes with only 1 hex key tool required and the innovative spherical lamp ends prevent breakages on long lamp changes.
UV Lamp Lab Unit
The GEW mini UV lab unit is a robust, well specified stand-alone bench-top UV curing unit for laboratory or low volume production environments.
The UV lamp lab unit utilises a 150mm wide stainless steel conveyor belt to drive samples under the UV lamp at variable speeds up to 70m/min.
The E2C UV lamp contains an ozone-free bulb to prevent the need for duct extraction and an integrated fan controls the lamp at a constant 80W/cm.
A robust, bench-top curing unit incorporating simple feeder/catcher trays, it is a perfect, cost-effective tool for laboratory, press proofing and even low volume production.
The UV lamp lab unit utilises a 150mm wide stainless steel conveyor belt to drive samples under the UV lamp at variable speeds up to 70m/min.
The E2C UV lamp contains an ozone-free bulb to prevent the need for duct extraction and an integrated fan controls the lamp at a constant 80W/cm.
A robust, bench-top curing unit incorporating simple feeder/catcher trays, it is a perfect, cost-effective tool for laboratory, press proofing and even low volume production.
Inert Gas Curing
Oxygen inhibits the UV curing mechanism. GEW’s inert gas chambers efficiently remove oxygen and improve the curing process. Find out more below:
Under normal atmospheric conditions, oxygen reacts with photoinitiators in the ink after they are exposed to UV light. This renders some of them inactive and limits the extent of polymerisation that can occur. The coating is then poorly cured or the process is forced to run much slower. This is where inert gas curing comes into play.
Curing under an inert atmosphere eliminates oxygen and significantly increases the rate and extent of cross-linking. Curing speeds are greatly improved, migration of harmful materials is reduced and the finished product odour is better.
Under normal atmospheric conditions, oxygen reacts with photoinitiators in the ink after they are exposed to UV light. This renders some of them inactive and limits the extent of polymerisation that can occur. The coating is then poorly cured or the process is forced to run much slower. This is where inert gas curing comes into play.
Curing under an inert atmosphere eliminates oxygen and significantly increases the rate and extent of cross-linking. Curing speeds are greatly improved, migration of harmful materials is reduced and the finished product odour is better.
GEW (EC) Ltd
Crompton Way, Crawley, West Sussex, RH10 9QR, United Kingdom
GEW (EC) Ltd designs and manufactures Arc and UV LED curing systems for printing, coating and converting applications. GEW is the leading manufacturer of UV curing systems for a range of markets, including narrow web label printing, offset printing, UV hot melt, wood coating and much more.