E2C HP
High powered variant of GEW’s E2C lamphead, designed for low migration and/or high-speed print applications.
E2C HP comprises a standard E2C UV lamp cassette housed in a larger casing to enable more air cooling and thus higher running power, up to 180W/cm. Perfect for low migration or high speed print applications up to 80cm wide, it boasts the same reliability and patented reflector designs contained in GEW’s most popular E2C product.
E2C HP still supports printing on the widest range of heat-sensitive materials because our actively air-cooled reflectors reduce heat transfer to the substrate. It also boasts GEW’s famous quick-change cassette design enabling a new lamp to be fitted in under 2 minutes with only 1 hex key tool required.
View Product on Company Website
E2C HP comprises a standard E2C UV lamp cassette housed in a larger casing to enable more air cooling and thus higher running power, up to 180W/cm. Perfect for low migration or high speed print applications up to 80cm wide, it boasts the same reliability and patented reflector designs contained in GEW’s most popular E2C product.
E2C HP still supports printing on the widest range of heat-sensitive materials because our actively air-cooled reflectors reduce heat transfer to the substrate. It also boasts GEW’s famous quick-change cassette design enabling a new lamp to be fitted in under 2 minutes with only 1 hex key tool required.
Other Products and Services from GEW (EC) Ltd
UV Control Systems
Simple touchscreen controls backed up by an internet-connected remote monitoring service − GEW RHINO control is unparalleled in the industry.
GEW UV systems are controlled by a combination of user commands and settings (entered on a modern industrial touchscreen), as well as machine signals which are either hardwired or electronically communicated to the GEW RHINO power units. GEW’s proprietary RHINO software is able to handle a vast array of common industrial control interfaces from simple relay logic to web-based APIs.
The HMI itself has a simple user interface for operating all key parameters on up to 16 lamps simultaneously, customised for each specific machine configuration. Optional accessories such as GEW’s UV monitoring or inert gas chambers are also controlled through the same user interface. It can be mounted freestanding in any location on or around the press or bevel mounted for seamless integration in machine panels.
GEW UV systems are controlled by a combination of user commands and settings (entered on a modern industrial touchscreen), as well as machine signals which are either hardwired or electronically communicated to the GEW RHINO power units. GEW’s proprietary RHINO software is able to handle a vast array of common industrial control interfaces from simple relay logic to web-based APIs.
The HMI itself has a simple user interface for operating all key parameters on up to 16 lamps simultaneously, customised for each specific machine configuration. Optional accessories such as GEW’s UV monitoring or inert gas chambers are also controlled through the same user interface. It can be mounted freestanding in any location on or around the press or bevel mounted for seamless integration in machine panels.
UV LED Lab Unit
GEW’s LED bench-top lab unit allows fast, accurate UV LED irradiation of samples or radiometers and can be specified with different wavelengths as required.
GEW’s LED lab unit utilises a high precision linear drive to pass a sample tray under the UV LED array.
Variable speed control ensures highly repeatable testing up to 100m/min with UV power adjustable in set increments and LED array height adjustable up to 25mm.
A simple magnetic hinged tray carries print samples or can accommodate an EIT radiometer for precise UV power measurement.
GEW’s LED lab unit utilises a high precision linear drive to pass a sample tray under the UV LED array.
Variable speed control ensures highly repeatable testing up to 100m/min with UV power adjustable in set increments and LED array height adjustable up to 25mm.
A simple magnetic hinged tray carries print samples or can accommodate an EIT radiometer for precise UV power measurement.
Inert Gas Curing
Oxygen inhibits the UV curing mechanism. GEW’s inert gas chambers efficiently remove oxygen and improve the curing process. Find out more below:
Under normal atmospheric conditions, oxygen reacts with photoinitiators in the ink after they are exposed to UV light. This renders some of them inactive and limits the extent of polymerisation that can occur. The coating is then poorly cured or the process is forced to run much slower. This is where inert gas curing comes into play.
Curing under an inert atmosphere eliminates oxygen and significantly increases the rate and extent of cross-linking. Curing speeds are greatly improved, migration of harmful materials is reduced and the finished product odour is better.
Under normal atmospheric conditions, oxygen reacts with photoinitiators in the ink after they are exposed to UV light. This renders some of them inactive and limits the extent of polymerisation that can occur. The coating is then poorly cured or the process is forced to run much slower. This is where inert gas curing comes into play.
Curing under an inert atmosphere eliminates oxygen and significantly increases the rate and extent of cross-linking. Curing speeds are greatly improved, migration of harmful materials is reduced and the finished product odour is better.
GEW (EC) Ltd
Crompton Way, Crawley, West Sussex, RH10 9QR, United Kingdom
GEW (EC) Ltd designs and manufactures Arc and UV LED curing systems for printing, coating and converting applications. GEW is the leading manufacturer of UV curing systems for a range of markets, including narrow web label printing, offset printing, UV hot melt, wood coating and much more.